使用钻石抛光粉抛光钻石需要对抛光过程有深入的了解和良好的知识，以获得高去除率，即高抛光率。在本研究中，研究了不同金刚石平面上的抛光速率。当摩擦系数达到最大值时，就会发现摩擦系数的影响。它为最大抛光速率指明了正确的方向。结果总结表明，抛光机理原则上源自基于粘着磨损机理的机械过程。一旦接触区域达到更高的温度，就会添加另一种抛光机制。这种抛光机制是一种热机制，通常取决于金刚石在高温下的行为，包括石墨化和机械温度的快速下降。 这个

THE USAGE OF DIAMOND POLISHING POWDER FOR POLISHING DIAMONDS REQUIRES DEEP UNDERSTANDING AND GOOD KNOWLEDGE OF THE POLISHING PROCESS TO ACQUIRE A HIGH REMOVAL RATE, I.E., HIGH POLISHING RATE. IN THIS RESEARCH, THE POLISHING RATE WAS INVESTIGATED ON THE DIFFERENT DIAMOND PLANES. THE EFFECT OF FRICTION COEFFICIENT WAS FOUND ONCE THE FRICTION COEFFICIENT REACHED THE MAXIMUM VALUE. IT INDICATED THE RIGHT DIRECTION FOR THE MAXIMUM POLISHING RATE. THE SUMMARY OF RESULTS SHOWS THAT THE POLISHING MECHANISM IS DERIVED IN PRINCIPLE FROM A MECHANICAL PROCESS WHICH IS BASED ON AN ADHESIVE WEAR MECHANISM. ONCE A HIGHER TEMPERATURE IS REACHED IN THE CONTACT AREA, ANOTHER POLISHING MECHANISM IS ADDED. THIS POLISHING MECHANISM IS A THERMAL MECHANISM WHICH NORMALLY DEPENDS UPON THE BEHAVIOR OF DIAMONDS AT HIGH TEMPERATURE, WHICH INVOLVES GRAPHITIZATION AND THE RAPID DROP IN MECHANICAL TEMPERATURES. THE