电子束（EB）钻孔过程使用聚焦的电子束。通过改变工艺参数，可以在可能非常坚硬的材料中钻取直径为0.1 MM至1.2 MM、孔长度约为8 MM的孔。钻孔速度可达每秒3000个孔。解释了该工艺本身、应用该工艺的设备、应用样品、钻孔质量和该工艺的有效性。

THE ELECTRON BEAM (EB) DRILLING PROCESS USES A FOCUSED BEAM OF ELECTRONS. BY VARYING THE PROCESS PARAMETERS HOLES WITH DIAMETERS FROM 0.1 MM UP TO 1.2 MM AND HOLE LENGTH UP TO APPROXIMATELY 8 MM CAN BE DRILLED INTO MATERIAL WHICH MIGHT BE EXTREMELY HARD. THE DRILLING SPEED CAN REACH UP TO 3000 HOLES PER SECOND. THE PROCESS ITSELF, THE EQUIPMENT TO APPLY THE PROCESS, SAMPLES OF APPLICATION, THE QUALITY OF THE DRILLING AND THE EFFECTIVITY OF THE PROCESS ARE EXPLAINED.