BS ISO 17901-2:2015规定了有关暴露特性的术语和测量方法 （曝光特性曲线、半最大曝光、R值、折射率振幅） 调制）用于双光束干涉记录的全息图。全息图的材料 测量值不限于任何特定值。ISO 17901的本部分不打算限制 制造过程。交叉引用:ISO 15902ISO 17901-1:2015购买本文件时可获得的所有现行修订均包含在购买本文件中。

BS ISO 17901-2:2015 specifies the terms and measurement method concerning exposure characteristics (exposure characteristic curve, exposure at half-maximum, R-value, amplitude of refractive index modulation) for the hologram recorded by double-beam interference. The materials of hologram to be measured are not restricted to any particular ones. This part of ISO 17901 does not intend to restrict manufacturing process.Cross References:ISO 15902ISO 17901-1:2015All current amendments available at time of purchase are included with the purchase of this document.