1.1 本指南使X射线光电子能谱（XPS）用户熟悉各种电荷控制和电荷位移参考技术，这些技术现在和已经用于从绝缘样品表面获取和解释XPS数据，并提供向客户或在文献中报告所用方法所需的信息。 1.2 本指南旨在适用于XPS中的电荷控制和电荷参考技术，不一定适用于电子激发系统。 1.3 以SI单位表示的值将被视为标准值。本标准不包括其他计量单位。 1.4 本标准并不旨在解决与其使用相关的所有安全性问题（如果有）。本标准的使用者有责任在使用前建立适当的安全、健康和环境实践并确定法规限制的适用性。1.5 本国际标准是根据世界贸易组织技术性贸易壁垒（TBT）委员会发布的《关于制定国际标准、指南和建议的原则的决定》中确立的国际公认的标准化原则制定的。 ======意义和用途====== 5.1 从XPS光谱中峰的能量位置的变化获得化学信息是使用XPS作为表面分析工具的主要兴趣。表面充电的作用是使光谱峰移动，而不依赖于它们与同一表面上的其他元素的化学关系。消除表面电荷对峰位置和峰形状的影响的愿望导致了几种经验方法的发展，这些方法旨在帮助解释XPS峰位置，确定表面化学，并允许比较导电和非导电的光谱同一元件的导电系统。假设光谱仪通常对非绝缘样品正常工作（见实践 E902 ). 5.2 尽管现在已经开发了高度可靠的方法来稳定大多数材料的XPS分析期间的表面电位 ( 5 , 6 ) 还没有开发出一种单一的方法来处理所有情况下的表面充电 ( 10 , 11 ) 对于绝缘体，任何控制或参考系统的适当选择将取决于样品的性质、仪器和所需信息。电荷控制和参考技术的适当使用将导致更一致、可再现的数据。强烈敦促研究人员报告已使用的对照和参考技术、用作标准的特定峰和结合能（如果有）以及用于确定最佳结果的标准，以便进行适当的比较。

1.1 This guide acquaints the X-ray photoelectron spectroscopy (XPS) user with the various charge control and charge shift referencing techniques that are and have been used in the acquisition and interpretation of XPS data from surfaces of insulating specimens and provides information needed for reporting the methods used to customers or in the literature. 1.2 This guide is intended to apply to charge control and charge referencing techniques in XPS and is not necessarily applicable to electron-excited systems. 1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. ====== Significance And Use ====== 5.1 The acquisition of chemical information from variations in the energy position of peaks in the XPS spectrum is of primary interest in the use of XPS as a surface analytical tool. Surface charging acts to shift spectral peaks independent of their chemical relationship to other elements on the same surface. The desire to eliminate the influence of surface charging on the peak positions and peak shapes has resulted in the development of several empirical methods designed to assist in the interpretation of the XPS peak positions, determine surface chemistry, and allow comparison of spectra of conducting and non-conducting systems of the same element. It is assumed that the spectrometer is generally working properly for non-insulating specimens (see Practice E902 ). 5.2 Although highly reliable methods have now been developed to stabilize surface potentials during XPS analysis of most materials ( 5 , 6 ) , no single method has been developed to deal with surface charging in all circumstances ( 10 , 11 ) . For insulators, an appropriate choice of any control or referencing system will depend on the nature of the specimen, the instruments, and the information needed. The appropriate use of charge control and referencing techniques will result in more consistent, reproducible data. Researchers are strongly urged to report both the control and referencing techniques that have been used, the specific peaks and binding energies used as standards (if any), and the criteria applied in determining optimum results so that the appropriate comparisons may be made.