1.1本规程涵盖了使用Si（111）单原子台阶高度试样校准原子力显微镜z标度的测量程序。 1.2应用当原子力显微镜（AFM）在其最高z放大率下运行时，即在纳米和亚纳米z位移范围内，该程序适用于环境或真空条件。当AFM用于测量半导体、光学表面和其他高科技部件的表面时，需要这些测量范围。 1.3以国际单位制表示的数值应视为标准。括号中给出的值仅供参考。 1.4本标准无意解决与其使用相关的所有安全问题（如有）。本标准的用户有责任在使用前制定适当的安全和健康实践，并确定监管限制的适用性。 ====意义和用途====== 仔细使用此实践可以产生校准 z -可追溯到长度国际单位制的放大倍数，在约1 nm的高度范围内，不确定性（k=2）约为7%。

1.1 This practice covers a measurement procedure to calibrate the z-scale of an atomic force microscope using Si(111) monatomic step height specimens. 1.2 Applications This procedure is applicable either in ambient or vacuum condition when the atomic force microscope (AFM) is operated at its highest levels of z-magnification, that is, in the nanometer and sub-nanometer ranges of z-displacement. These ranges of measurement are required when the AFM is used to measure the surfaces of semiconductors, optical surfaces, and other high technology components. 1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. ====== Significance And Use ====== Careful use of this practice can yield calibrated z -magnifications traceable to the SI unit of length with uncertainties (k = 2) of approximately 7 % over height ranges of approximately 1 nm.