Semiconductor devices - Micro-electromechanical devices - Part 47: Silicon based MEMS fabrication technology - Measurement method of bending strength of microstructures
半导体器件.微机电器件.第47部分:硅基MEMS制造技术.微结构弯曲强度的测量方法

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Semiconductor devices. Micro-electromechanical devices-Silicon based MEMS fabrication technology. Measurement method of pull-press and shearing strength of micro bonding area
半导体器件 微机电设备

2016-11-30

Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area
半导体器件 - 微机电器件 - 第25部分:硅基存储器制造技术 - 微接合区域的拉压和剪切强度测量方法

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Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area (IEC 62047-25:2016); German version EN 62047-25:2016
半导体器件.微机电器件.第25部分:硅基MEMS制造技术.微键合区域拉压和剪切强度的测量方法（IEC 62047-25-2016）；德文版EN 62047-25:2016

2017-04-01