1.1 这种实践提供了一种可再现的手段，通过该手段可以表征扫描电子显微镜（SEM）性能的一个方面。SEM的分辨率取决于许多因素，其中一些因素是电子束电压和电流、透镜像差、样品中的对比度以及操作员-仪器-材料的相互作用。然而，任何一组条件的分辨率都受到电子束大小的限制。这种尺寸可以通过测量多种材料的有效表观边缘锐度来量化，建议使用其中两种材料。这种实践需要具有例如执行线扫描迹线的能力的SEM， Y -偏转波形生成。这种做法实用的SEM放大倍数范围为1000 ×至50 000 × . 可以尝试更高的放大率，但可能会出现进行精确测量的困难。 1.2 本标准并不旨在解决与其使用相关的所有安全问题（如有）。本标准的使用者有责任在使用前制定适当的安全、健康和环境实践，并确定监管限制的适用性。 1.3 本国际标准是根据世界贸易组织技术性贸易壁垒委员会发布的《关于制定国际标准、指南和建议的原则的决定》中确立的国际公认的标准化原则制定的。 ====意义和用途====== 4.1 作为第一步，SEM的传统分辨率测试需要在高倍率下拍摄细颗粒样品的显微照片。 操作员需要在显微照片上测量两个相邻但分离的边缘之间的距离。这些边缘通常相距不到一毫米。它们的图像质量往往低于最佳值，这受到具有如此小直径和低电流的光束的S/N比的限制。操作员的判断取决于进行测量的人员的个人敏锐度，并且可能有很大差异。 4.2 使用这种实践导致SEM电子束尺寸表征，其比使用细颗粒样品的传统分辨率测试更具可重复性。

1.1 This practice provides a reproducible means by which one aspect of the performance of a scanning electron microscope (SEM) may be characterized. The resolution of an SEM depends on many factors, some of which are electron beam voltage and current, lens aberrations, contrast in the specimen, and operator-instrument-material interaction. However, the resolution for any set of conditions is limited by the size of the electron beam. This size can be quantified through the measurement of an effective apparent edge sharpness for a number of materials, two of which are suggested. This practice requires an SEM with the capability to perform line-scan traces, for example, Y -deflection waveform generation, for the suggested materials. The range of SEM magnification at which this practice is of utility is from 1000 × to 50 000 × . Higher magnifications may be attempted, but difficulty in making precise measurements can be expected. 1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. ====== Significance And Use ====== 4.1 The traditional resolution test of the SEM requires, as a first step, a photomicrograph of a fine particulate sample taken at a high magnification. The operator is required to measure a distance on the photomicrograph between two adjacent, but separate edges. These edges are usually less than one millimetre apart. Their image quality is often less than optimum limited by the S/N ratio of a beam with such a small diameter and low current. Operator judgment is dependent on the individual acuity of the person making the measurement and can vary significantly. 4.2 Use of this practice results in SEM electron beam size characterization which is significantly more reproducible than the traditional resolution test using a fine particulate sample.