ISO 18922:2002适用于评估干燥、处理过的照相胶片的耐划伤性。它规定了两种测试方法，用于评估乳剂或基材侧的耐刮擦性。这两种测试方法通常给出可比较的结果。它提供了在受控条件下进行的经验实验室测试，但不一定预测任何特定商用机器中薄膜的实际耐刮擦性。 方法A给出了产生划痕的最小载荷要求的测量方法，需要较少复杂的评估设备，对试样光学条件的要求也不那么严格。 方法B提供了由各种触针负载产生的雾度的测量，是对材料划痕特性的更完整的测量，并且是优选的方法。

ISO 18922:2002 is applicable to evaluating the scratch resistance of dry, processed photographic film. It specifies two test methods for evaluating the scratch resistance on either the emulsion or the base side. The two test methods usually give comparable results. It provides empirical laboratory tests made under controlled conditions, but does not necessarily predict the actual scratch resistance of a film in any particular commercial machine. Method A gives a measure of the minimum load requirement to produce a scratch, requires less elaborate evaluation equipment and is less stringent in its requirements of the optical condition of the specimens. Method B provides a measurement of haze produced by various stylus loads, is a more complete measure of scratch characteristics of a material and is the preferred method.