本文件描述了一种辉光放电光发射光谱法，用于测定金属氧化物薄膜的厚度、单位面积质量和化学成分。 该方法适用于厚度为1nm至10000nm的金属氧化膜。金属元素 氧化物可以包括铁、铬、镍、铜、钛、硅、钼、锌、镁、锰、锆和铝中的一种或多种元素 可通过该方法确定的是O、C、N、H、P和S。交叉引用:ISO 14707ISO 14284ISO 16962:2017ISO 5725-2ISO 5725-1ISO 5725-6ISO 9000:2015ISO/IEC 17025:2017购买本文件时可获得的所有现行修订均包括在购买本文件中。

This document describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films. This method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn, Zr and Al. Other elements that can be determined by the method are O, C, N, H, P and S.Cross References:ISO 14707ISO 14284ISO 16962:2017ISO 5725-2ISO 5725-1ISO 5725-6ISO 9000:2015ISO/IEC 17025:2017All current amendments available at time of purchase are included with the purchase of this document.