本文件规定了一种通过X射线反射仪（XRR）评估平板衬底上单层和多层薄膜厚度、密度和界面宽度的方法，这些薄膜的厚度在1 nm和1μm之间。 该方法使用单色准直光束，扫描角度或散射矢量。类似的考虑也适用于使用分布式探测器并行数据采集的会聚光束或扫描波长的情况，但这里不描述这些方法。虽然提到了漫反射XRR，且实验要求类似，但本文件并未涉及这一点。 测量可以在各种配置的设备上进行，从实验室仪器到同步辐射光束线的反射计或工业中使用的自动化系统。 在数据收集期间，应注意图层的最终不稳定性，这将导致测量结果的准确性降低。由于在单一波长下进行的XRR不能提供有关各层的化学信息，因此应注意试样表面可能存在的污染或反应。最外层结果的准确性受到表面变化的强烈影响。 注1:本文件未描述专有技术。

This document specifies a method for the evaluation of thickness, density and interface width of single layer and multi-layered thin films which have thicknesses between approximately 1 nm and 1 μm, on flat substrates, by means of X-Ray Reflectometry (XRR). This method uses a monochromatic, collimated beam, scanning either an angle or a scattering vector. Similar considerations apply to the case of a convergent beam with parallel data collection using a distributed detector or to scanning wavelength, but these methods are not described here. While mention is made of diffuse XRR, and the requirements for experiments are similar, this is not covered in the present document. Measurements may be made on equipment of various configurations, from laboratory instruments to reflectometers at synchrotron radiation beamlines or automated systems used in industry. Attention should be paid to an eventual instability of the layers over the duration of the data collection, which would cause a reduction in the accuracy of the measurement results. Since XRR, performed at a single wavelength, does not provide chemical information about the layers, attention should be paid to possible contamination or reactions at the specimen surface. The accuracy of results for the outmost layer is strongly influenced by any changes at the surface. NOTE 1 Proprietary techniques are not described in this document.