为了符合三卤甲烷（THMs）的最高污染物水平 和卤乙酸（HAAs），许多公用事业公司正在使用替代消毒剂，如氯 二氧化物（ClO₂）和氯胺（NH₂Cl）。ClO₂在台架和演示规模中的使用 试验发现，没有三卤甲烷或三卤甲烷，或者只产生微量，但 它确实形成了低水平的二卤代HAAs（DXAAs）。在溴存在的情况下，溴化 DXAA物种形成。氯胺化后并没有阻止水体中THM的形成 总有机碳和/或溴含量高。在NH₂Cl存在下，THM的形成具有重要意义 约为游离氯存在时形成的量的20%。 因为ClO₂是一种强自由基氧化剂，它可以形成类似于的氧化副产物 由臭氧（羧酸、醛酮酸、醛类）形成，但通常形成ClO₂ 副产品的含量（以重量计）低于臭氧。羧酸的形成， 尤其是草酸盐，随着ClO₂需求的增加而增加。消毒后产生的次级副产品 （例如，卤代乙醛）也会形成。包括22个参考文献、表格和图表。

In order to comply with the maximum contaminant levels for trihalomethanes (THMs) and haloacetic acids (HAAs), many utilities are utilizing alternative disinfectants, such as chlorine dioxide (ClO₂) and chloramines (NH₂Cl). The use of ClO₂ in bench- and demonstration-scale tests was found to produce no THMs or trihalogenated HAAs, or only trace amounts, but it did form low levels of dihalogenated HAAs (DXAAs). In the presence of bromide, brominated DXAA species formed. Post-chloramination did not stop THM formation in waters high in total organic carbon and/or bromide. THM formation in the presence of NH₂Cl was of the order of 20 percent of the amount that would have formed in the presence of free chlorine. Because ClO₂ is a strong radical oxidant, it can form oxidation byproducts similar to those formed by ozone (carboxylic acids, aldoketoacids, aldehydes), but ClO₂ typically forms byproducts at lower levels (on a weight basis) than ozone. The formation of carboxylic acids, especially oxalate, increased with increasing ClO₂ demand. Secondary byproducts from postdisinfection (e.g., haloacetaldehydes) also formed. Includes 22 references, table, figures.