2002年2月28日，美国环境保护局（USEPA）颁布了新的砷规则，并设定了最高砷含量 砷的污染水平（MCL）为10 ug/L。较低的砷MCL将导致 许多地下水系统需要处理其供水以符合这一规则。 美国环境保护局估计，大约3300个供水系统将受到新项目的影响 根据砷的规律，这些系统中绝大多数是小型地下水系统 服务不到3300人。 美国环保局已经确定了几种最佳可用技术 （BAT）用于除砷，包括离子交换、活性氧化铝、反渗透、， 电渗析逆转和凝血/过滤。然而，在砷规则中，美国环保局 承认CH2M HILL在1994年（Chang，1994）率先开发的一项新兴技术 除砷，采用混凝/微滤（C/MF）工艺。 在制定砷规则之前和期间，美国环保局和其他机构建议 对于小型系统而言，C/MF工艺过于昂贵和复杂，只有少数大型 水系统将考虑这项技术。然而，膜的成本， 尤其是微滤，它的数量持续减少，并与其他产品竞争 技术。此外，水务行业也获得了丰富的运营经验 在过去的10年里使用了微过滤器，从而使他们的生活更加舒适 复杂性 C/MF工艺已在多个地点进行了去除砷的中试试验 包括新墨西哥州阿尔伯克基（Chwirka，2000）、内华达州法伦、德克萨斯州埃尔帕索和凤凰城， 亚利桑那州（艾米，2000年）。本文介绍了相关的基本背景 介绍了C/MF脱砷工艺，并总结了已完成的中试试验 已经在几个地点进行了测试。包括4个参考文献、图表。

On February 28, 2002, the US Environmental Protection Agency (USEPA) promulgated the new Arsenic Rule and set the Maximum Contaminant Level (MCL) for arsenic at 10 ug/L. This lower arsenic MCL will result in many groundwater systems needing to treat their water supplies to comply with this rule. The USEPA estimates that approximately 3,300 water systems will be impacted by the new Arsenic Rule, the overwhelming majority of these systems are small groundwater systems serving less than 3,300 people. There are several technologies that the USEPA has identified as Best Available Technologies (BAT) for arsenic removal including ion exchange, activated alumina, reverse osmosis, electrodialysis reversal, and coagulation/filtration. However, in the Arsenic Rule, the USEPA recognized an emerging technology pioneered by CH2M HILL in 1994 (Chang, 1994) for arsenic removal, the coagulation/microfiltration (C/MF) process. Prior to and during the Arsenic Rule development, the USEPA and others suggested that the C/MF process was too expensive and complex for small systems, and that only a few large water systems would consider this technology. However, the cost of membranes, microfiltration in particular, continues to decrease and become competitive with other technologies. In addition, the water industry has gained significant operational experience with microfilters over the last 10 years, resulting in a greater level of comfort about their complexity. The C/MF process has been pilot tested at several locations for the removal of arsenic including Albuquerque, New Mexico (Chwirka, 2000), Fallon, Nevada, and El Paso, Texas, and Phoenix, Arizona (Amy, 2000). This paper presents a fundamental background related to the C/MF process for arsenic removal and provides a summary of pilot testing that has been performed at several sites. Includes 4 references, figures.