本文件描述了测量为真空室设计的部件和整个真空室的除气率的程序。除气率预计低于10？5帕m3 s？1（10？2 Pa L s？1）在23°C下，并从适用于高或超高真空应用的设备中出现。除气物质或蒸汽的分子量低于300u。 上限10？5帕m3 s？总除气率的1与除气材料的尺寸、总表面积和纹理或状态无关。如果确定了特定的除气率(单位面积的除气率)，则该面积不是包括表面粗糙度的比表面积，而是标称几何面积。当难以确定样品的标称几何表面积时，如粉末、多孔材料、非常粗糙的表面或复杂的器件，质量比除气率（例如。g.每克排气速率）。 对于许多实际应用，确定总除气率就足够了。如果使用灵敏度取决于气体种类的测量仪器，则总放气速率以氮气当量给出。然而，在总放气速率太高的情况下，识别干扰气体种类，并测量其放气速率以改进样品材料。本文件涵盖了这两种情况。 一些脱气分子可以吸附在表面上，停留时间远超过测量总时间。当没有直接视线时，这种分子不能被检测仪器检测到。这被认为是表面效应，表面分析研究比这里考虑的一般除气率测量更有用。此外，通过UV光或X射线的照射从表面释放的分子超出了本文的范围。 编写本文件是为了标准化除气率的测量，使在不同实验室和通过不同方法获得的值具有可比性。为此，对于任何所描述的方法，对于每种方法的最重要参数并根据计量水平向国际系统(SI)提供可追溯性。 通过质量损失测量除气率主要是为测试航天器和卫星材料而开发的，不是特定于气体的。对于可接受的测量时间，质量损失测量需要明显更高的除气速率（>10？5 Pa m3 s？1）高于高真空和超高真空部件的典型值。此外，由于真空室的重量，不可能原位测量样品，因为天平不是真空兼容的。由于这些原因，本文件中不考虑质量损失测量。 假设本文件的用户熟悉高真空和超高真空技术以及相应的测量仪器，例如电离仪和四极质谱仪。

This document describes procedures to measure outgassing rates from components designed for vacuum chambers and of vacuum chambers as a whole. The outgassing rates are expected to be lower than 10^？5 Pa m³ s^？1 (10^？2 Pa L s^？1) at 23 °C and to emerge from devices that are suitable for high or ultra-high vacuum applications. The molecular mass of the outgassing species or vapour is below 300 u. The upper limit 10^？5 Pa m³ s^？1 of total outgassing rate is specified independent of the size, the total surface area and texture or state of the outgassing material. If a specific outgassing rate (outgassing rate per area) is determined, the area is not a specific surface area including the surface roughness, but the nominal geometrical one. When it is difficult to determine the nominal geometrical surface area of the sample, such as powders, porous materials, very rough surfaces, or complex devices, mass specific outgassing rate (e.g. outgassing rate per gram) is used. For many practical applications, it is sufficient to determine the total outgassing rate. If a measuring instrument, which sensitivity is gas species dependent, is used, the total outgassing rate are given in nitrogen equivalent. In cases, however, where the total outgassing rate is too high, the disturbing gas species is identified, and its outgassing rate is measured in order to improve the sample material. This document covers both cases. Some outgassing molecules can adsorb on a surface with a residence time that is much longer than the total time of measurement. Such molecules cannot be detected by a detecting instrument when there is no direct line of sight. This is considered as a surface effect and surface analytical investigations are more useful than general outgassing rate measurements considered here. Also, molecules that are released from the surface by irradiation of UV light or X-rays, are out of the scope of this document. This document is written to standardize the measurement of outgassing rates in such a way that values obtained at different laboratories and by different methods are comparable. To this end, for any of the described methods, traceability is provided to the System International (SI) for the most important parameters of each method and according to the metrological level. Outgassing rate measurements by mass loss, which were mainly developed for testing of spacecraft and satellite materials, are not gas specific. For acceptable measurement times, mass loss measurements require significantly higher outgassing rates (>10^？5 Pa m³ s^？1) than typical for high and ultrahigh vacuum components. Also, it is not possible to measure the sample in situ due to the weight of the vacuum chamber, since the balances are not vacuum compatible. For these reasons, mass loss measurements are not considered in this document. It is assumed that the user of this document is familiar with high and ultra-high vacuum technology and the corresponding measuring instrumentation such as ionization gauges and quadrupole mass spectrometers.