COATING, ALUMINUM, ION VAPOR DEPOSITED (SUPERSEDING MIL-C-83488B) (S/S BY MIL-DTL-83488D)
离子气相沉积铝涂层（取代MIL-C-83488B）（S/S BY MIL-DTL-834888d）

1987-07-30

COATING, ALUMINUM, ION VAPOR DEPOSITED (SUPERSEDING MIL-C-83488B) (S/S BY MIL-DTL-83488D)
离子气相沉积铝涂层（取代MIL-C-83488B）（由MIL-DTL-83488D提供）

1985-05-01

Nadcap Requirements for Vapor Deposited Coatings
Nadcap对气相沉积涂层的要求

2017-06-07

Coating, Titanium Nitride Physical Vapor Deposition
涂层 氮化钛物理气相沉积

2019-11-04

Physical Vapor Deposition of Metals: Physical Vapor Deposition of Aluminum for Protection Against Corrosion (Stabilized: Oct 2017)
金属的物理气相沉积:用于防腐蚀的铝的物理气相沉积（稳定化:2017年10月）

2017-10-04

Coating, Aluminum Oxide Detonation Deposition
涂层 氧化铝爆轰沉积

2022-02-23

Coating, Vapor Deposited Poly-Monochloro-Para-Xylylene for Microcircuits (Stabilized: Oct 2015)
微电路用气相沉积聚氯代对二甲苯涂层（稳定化:2015年10月）

2015-10-22

COATING, INORGANICALLY BONDED ALUMINUM (ELECTROPHORETICALLY DEPOSITED) (S/S BY MIL-C-81797A)
无机结合铝涂层（电泳沉积）（密耳-C-81797A的S/S）

1991-10-29

COATING, ALUMINUM, VACUUM DEPOSITED (ASG) (NO S/S DOCUMENT) (SUPERSEDING MIL-C-23217A)
涂层 铝 真空沉积（ASG）（无S/S文件）（取代MIL-C-23217A）

1971-03-10

COATING, ALUMINUM, VACUUM DEPOSITED (ASG) (NO S/S DOCUMENT) (SUPERSEDING MIL-C-23217A)
真空沉积铝涂层（ASG）（无S/S文件）（取代MIL-C-23217A）

1969-08-25

COATING, INORGANICALLY BONDED ALUMINUM (ELECTROPHORETICALLY DEPOSITED) (NO S/S DOCUMENT) (SUPERSEDING MIL-C-81797)
无机结合铝涂层（电泳沉积）（无S/S文件）（取代MIL-C-81797）

1994-01-12