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现行 BS 4479-9:1990
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Design of articles that are to be coated-Recommendations for low pressure and vacuum deposited coatings 待涂层物品的设计
发布日期: 1990-07-31
通过低压和真空沉积进行涂层的物品的设计,并说明首选和不推荐的设计特征。介绍了适用于低压真空镀膜的三种主要工艺,即真空镀膜、离子镀和溅射。结合BS 4479-1阅读交叉参考:BS 4479:第1BS 6413部分:第3.1节
Design of articles that are to be coated by low pressure and vacuum deposition and illustrates preferred and deprecated design features. Describes three main processes applicable to coating by low pressure and vacuum deposition i.e. vacuum deposition, ion plating and sputtering. To be read in conjunction with BS 4479-1Cross References:BS 4479:Part 1BS 6413:Section 3.1
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发布单位或类别: 英国-英国标准学会
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