磁控溅射用钌靶
Magnetron sputtering ruthenium target

2017-09-29

钨钛合金靶材
Tungsten titanium alloy sputtering target

2016-07-11

平面磁控溅射靶材　光学薄膜用铌靶
Flat magneting sputtering target—Niobium target for optical coating

2009-12-04

平面磁控溅射靶材　光学薄膜用硅靶
Flat magneting sputtering target—Silicon target for optical coating

2009-12-04

电子薄膜用高纯铜溅射靶材
High-purity sputtering copper target used in electronic film

2012-11-07

电子薄膜用高纯钛溅射靶材
High-purity sputtering titanium target used in electronic film

2013-10-17

电子薄膜用高纯钴靶材
High-purity cobalt sputtering target used in electronic film

2015-04-30

磁性溅射靶材透磁率测试方法
Testing method on pass through flux of magnetic sputtering target

2016-07-11

集成电路器件用镍钒合金靶材
Sputtering nickel vanadium alloy target used in integrated circuit device

2013-10-17

电子薄膜用高纯钨及钨合金溅射靶材
High-purity tungsten and tungsten alloy sputtering target used in electronic film

2015-04-30

电子薄膜用高纯铝及铝合金溅射靶材
High-Purity sputtering aluminium and aluminium alloy target used in electronic film

2013-09-06

溅射靶材-背板结合质量超声波检验方法
Standard practice for ultrasonic C-scan bond evaluation of sputtering target-backing plate assemblies

2012-11-07

电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications

2013-10-17