现行

BS ISO 10110-1-2019

Optics and photonics. Preparation of drawings for optical elements and systems-General
光学和光子学 光学元件和系统图纸的编制

2019-10-11

现行

BS ISO 10110-6-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Centring tolerances
光学和光子学 光学元件和系统图纸的编制

2015-07-31

现行

BS ISO 10110-8-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Surface texture
光学和光子学 光学元件和系统图纸的编制

2019-11-22

现行

BS ISO 10110-12-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Aspheric surfaces
光学和光子学 光学元件和系统图纸的编制

2019-11-29

现行

BS ISO 10110-5-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Surface form tolerances
光学和光子学 光学元件和系统图纸的编制

2015-08-31

现行

BS ISO 10110-9-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Surface treatment and coating
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

BS ISO 10110-11-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Non-toleranced data
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

KS B ISO 10110-1

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学 - 光学元件和系统图纸准备第1部分:总则

2017-09-28

现行

KS B ISO 10110-1(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学.光学元件和系统图纸的制备.第1部分:总则

2017-09-28

现行

ISO 10110-1-2019

Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
光学和光子学 - 光学元件和系统图纸准备第1部分:总则

2019-10-10

现行

MIL MIL-STD-34 Notice 1-Cancellation

PREPARATION OF DRAWING FOR OPTICAL ELEMENTS AND OPTICAL SYSTEMS, GENERAL REQUIREMENTS FOR (S/S BY ASME/ANSI-Y14.18M-1986(R03))
光学元件和光学系统图纸的编制.（S/S BY ASME/ANSI-Y14.18M-1986（R03））的一般要求

1995-03-28

现行

MIL MIL-STD-34

PREPARATION OF DRAWING FOR OPTICAL ELEMENTS AND OPTICAL SYSTEMS, GENERAL REQUIREMENTS FOR (S/S BY ASME/ANSI-Y14.18M-1986(R03))
光学元件和光学系统图纸的编制 一般要求（ASME/ANSI-Y14.18M-1986（R03）规定的S/S）

1960-11-03

现行

BS ISO 10110-13-1997

Optics and optical instruments. Preparation of drawings for optical elements and systems-Laser irradiation damage threshold
光学和光学仪器 准备光学元件和系统的图纸 激光辐照损伤阈值

1998-03-15

现行

BS ISO 10110-17-2004

Optics and optical instruments. Preparation of drawings for optical elements and systems-Laser irradiation damage threshold
光学和光学仪器 光学元件和系统图纸的编制

2004-06-01

现行

KS B ISO 10110-6

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제6부: 편심공차
光学和光学仪器光学元件和系统图纸的制备第6部分:定心公差

2017-11-27

现行

KS B ISO 10110-8

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제8부: 표면질감; 거칠기 및 파형
光学和光学仪器光学元件和系统图纸的制备第8部分:表面结构

2017-11-27

现行

KS B ISO 10110-6(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제6부: 편심공차
光学和光学仪器.光学元件和系统图纸的编制.第6部分:定心公差

2017-11-27

现行

KS B ISO 10110-8(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제8부: 표면질감; 거칠기 및 파형
光学和光学仪器.光学元件和系统图纸的制备.第8部分:表面结构

2017-11-27

现行

BS ISO 10110-19-2015

Optics and photonics. Preparation of drawings for optical elements and systems-General description of surfaces and components
光学和光子学 光学元件和系统图纸的编制

2015-07-31

现行

KS B ISO 10110-12

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제12부: 비구면
光学和光子学.光学元件和系统绘图的制备.第12部分:非球面

2018-07-02