现行

GB/T 37248-2018

高纯氧化铝 痕量金属元素的测定 电感耦合等离子体发射光谱法
High purity aluminium oxide—Determination of trace metal elements—Inductively coupled plasma optical emission spectrometry

2018-12-28

现行

YS/T 474-2021

高纯镓化学分析方法 痕量元素的测定 电感耦合等离子体质谱法
Chemical analysis methods of high purity gaIIium—Determination of trace element—Inductively coupled plasma mass spectrometry

2021-03-05

现行

DIN 50451-7

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS
半导体技术用材料的试验.液体中微量元素的测定.第7部分:用ICP-MS测定高纯度盐酸中的31种元素

2018-04-01

现行

YS/T 1012-2014

高纯镍化学分析方法　杂质元素含量的测定　辉光放电质谱法
Methods for chemical analysis of high purity nickel—Determination of trace impurity elements content—Glow discharge mass spectrometry

2014-10-14

现行

YS/T 922-2013

高纯铜化学分析方法　痕量杂质元素含量的测定　辉光放电质谱法
Methods for chemical analysis of high purity copper—Determination of trace impurity elements content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 917-2013

高纯镉化学分析方法　痕量杂质元素含量的测定　辉光放电质谱法
Chemical analysis methods for high purity cadmium—Determination of trace impurity elements content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 897-2013

高纯铌化学分析方法　痕量杂质元素的测定　辉光放电质谱法
Methods for chemical analysis of high purity niobium—Determination of trace impurity element content—Glow discharge mass spectrometry

2013-10-17

现行

GB/T 36590-2018

Method for chemical analysis of high purity silver—Determination of trace impurity elements contents—Glow discharge mass spectrometry

2018-09-17

现行

GB/T 36590-2018

高纯银化学分析方法 痕量杂质元素的测定 辉光放电质谱法
Method for chemical analysis of high purity silver—Determination of trace impurity elements contents—Glow discharge mass spectrometry

2018-09-17

现行

YS/T 901-2013

高纯钨化学分析方法　痕量杂质元素的测定　辉光放电质谱法
Methods for chemical analysis of high purity tungsten—Determination of trace impurity element content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 899-2013

高纯钽化学分析方法　痕量杂质元素的测定　辉光放电质谱法
Methods for chemical analysis of high purity tantalum—Determination of trace impurity element content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 891-2013

高纯钛化学分析方法　痕量杂质元素的测定　辉光放电质谱法
Methods for chemical analysis of high purity titanium—Determination of trace impurity element content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 895-2013

高纯铼化学分析方法　痕量杂质元素的测定　辉光放电质谱法
Methods for chemical analysis of high purity rhenium—Determination of trace impurity element content—Glow discharge mass spectrometry

2013-10-17

现行

YS/T 1347-2020

高纯铪化学分析方法 痕量杂质元素含量的测定 辉光放电质谱法
Method for chemical analysis of high purity hafnium-Determination of trace impurity elements content-Glow discharge mass spectrometry

2020-04-16

现行

YS/T 892-2013

高纯钛化学分析方法　痕量杂质元素的测定　电感耦合等离子体质谱法
Methods for chemical analysis of high purity titanium—Determination of trace impurity element content—Inductively coupled plasma mass spectrometry

2013-10-17

现行

YS/T 900-2013

高纯钨化学分析方法　痕量杂质元素的测定　电感耦合等离子体质谱法
Methods for chemical analysis of the high purity tungsten—Determination of trace impurity element content—Inductively coupled plasma mass spectrometry

2013-10-17

现行

YS/T 898-2013

高纯钽化学分析方法　痕量杂质元素的测定　电感耦合等离子体质谱法
Methods for chemical analysis of the high purity tantalum—Determination of trace impurity element content—Inductively coupled plasma mass spectrometry

2013-10-17

现行

YS/T 896-2013

高纯铌化学分析方法　痕量杂质元素的测定　电感耦合等离子体质谱法
Methods for chemical analysis of high purity niobium—Determination of trace impurity element content—Inductively coupled plasma mass spectrometry

2013-10-17

现行

DIN 50451-8-DRAFT

Draft Document - Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS
文件草案.半导体技术材料的试验.液体中微量元素的测定.第8部分:用ICP-MS测定高纯度硫酸中的33种元素

2022-01-01

现行

YS/T 1288.4-2018

高纯锌化学分析方法第 4 部分:痕量元素含量的测定辉光放电质谱法
Methods for chemical analysis of high purity zinc-Part 4: Determination of trace impurity elements content-Glow discharge mass spectrometry

2018-10-22