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Standard Guide to Scanner and Tip Related Artifacts in Scanning Tunneling Microscopy and Atomic Force Microscopy 扫描隧道显微镜和原子力显微镜中的扫描仪和尖端相关人工标准指南
发布日期: 2020-12-01
1.1 所有显微镜都会出现伪影。本文件的目的是提供扫描隧道显微镜(STM)和原子力显微镜(AFM)中常见观察到的伪影的描述,这些伪影与探针运动和尖端与表面相互作用的几何因素有关,提供示例的文献参考,并在可能的情况下提供伪影来源的解释。由于扫描探针显微镜领域是一个新兴领域,本文件并不全面,而是作为一个指南,以实践显微镜可能存在的陷阱。 识别工件的能力应有助于可靠评估仪器操作和报告数据。 1.2 这里将定义一组有限的术语。与STM和AFM仪器的描述、操作和校准相关的术语的完整描述超出了本文件的范围。 1.3 以国际单位制表示的数值应视为标准值。本标准不包括其他计量单位。 1.4 本国际标准是根据世界贸易组织技术性贸易壁垒(TBT)委员会发布的《关于制定国际标准、指南和建议的原则的决定》中确立的国际公认标准化原则制定的。 ====意义和用途====== 4.1 本汇编仅限于扫描隧道显微镜和接触模式原子力显微镜中观察到的伪影。特别是,本文重点关注与探针运动相关的伪影以及尖端和表面相互作用的几何因素。这里描述的许多伪影扩展到其他扫描探针显微镜,其中压电扫描仪用作定位元件或使用类似几何形状的尖端。 这些不是与STM或AFM获得的测量相关的唯一伪影。伪影也可能来自以下方面:控制电子设备(例如,不当的反馈增益);噪声(机械、声学或电子);漂移(热或机械);信号检测方法特有的问题(例如,光杠杆方案中的激光溢出);图像处理使用不当(实时或后处理);样品制备、环境(例如湿度)和尖端- 表面相互作用(例如,过度静电、粘附力、剪切力和压缩力)。建议这些其他类型的人工制品构成未来ASTM指南的基础。
1.1 All microscopes are subject to artifacts. The purpose of this document is to provide a description of commonly observed artifacts in scanning tunneling microscopy (STM) and atomic force microscopy (AFM) relating to probe motion and geometric considerations of the tip and surface interaction, provide literature references of examples and, where possible, to offer an interpretation as to the source of the artifact. Because the scanned probe microscopy field is a burgeoning one, this document is not meant to be comprehensive but rather to serve as a guide to practicing microscopists as to possible pitfalls one may expect. The ability to recognize artifacts should assist in reliable evaluation of instrument operation and in reporting of data. 1.2 A limited set of terms will be defined here. A full description of terminology relating to the description, operation, and calibration of STM and AFM instruments is beyond the scope of this document. 1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard. 1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. ====== Significance And Use ====== 4.1 This compilation is limited to artifacts observed in scanning tunneling microscopes and contact-mode atomic force microscopes. In particular, this document focuses on artifacts related to probe motion and geometrical considerations of the tip and surface interaction. Many of the artifacts described here extend to other scanned probe microscopies where piezoscanners are used as positioning elements or where tips of similar geometries are used. These are not the only artifacts associated with measurements obtained by STM or AFM. Artifacts can also arise from the following: control electronics (for example, improper feedback gains); noise (mechanical, acoustic, or electronic); drift (thermal or mechanical); problems unique to signal detection methods (for example, laser spillover in optical lever schemes); improper use of image processing (real time or post processed); sample preparation, environment (for example, humidity) and tip-surface interaction (for example, excessive electrostatic, adhesive, shear, and compressive forces). It is suggested that these other types of artifacts form the basis of future ASTM guides.
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归口单位: E42.14
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