现行

MIL MIL-P-11879D

PYROMETER, OPTICAL (SUPERSEDING MIL-P-11879C) (NO S/S DOCUMENT)
PYROMETER OPTICAL（SUPEREDING MIL-P-11879C）（NO S/S文件）

1974-10-11

现行

SCTE 85-2 2017(R2022)

HMS HE Optics Management Information Base (MIB), Part 2: SCTE-HMS-HE-OPTICAL RECEIVER-MIB
HMS HE光学管理信息库（MIB） 第2部分:SCTE-HMS-HE-OPTICAL RECEIVER-MIB

现行

SCTE 85-2 2017(R2022)

HMS HE Optics Management Information Base (MIB), Part 2: SCTE-HMS-HE-OPTICAL RECEIVER-MIB
HMS HE光学管理信息库（MIB） 第2部分:SCTE-HMS-HE-OPTICAL RECEIVER-MIB

现行

SCTE 85-4 2017(R2022)

HMS Common Inside Plant Management Information Base (MIB) SCTE-HMS-HE-OPTICAL-SWITCH-MIB
HMS通用工厂内部管理信息库（MIB）SCTE-HMS-HE-OPTICAL-SWITCH-MIB

现行

SCTE 85-4 2017(R2022)

HMS Common Inside Plant Management Information Base (MIB) SCTE-HMS-HE-OPTICAL-SWITCH-MIB
HMS通用工厂内部管理信息库（MIB）SCTE-HMS-HE-OPTICAL-SWITCH-MIB

现行

BS ISO 10110-1-2019

Optics and photonics. Preparation of drawings for optical elements and systems-General
光学和光子学 光学元件和系统图纸的编制

2019-10-11

现行

BS ISO 10110-6-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Centring tolerances
光学和光子学 光学元件和系统图纸的编制

2015-07-31

现行

BS ISO 10110-8-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Surface texture
光学和光子学 光学元件和系统图纸的编制

2019-11-22

现行

BS ISO 10110-12-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Aspheric surfaces
光学和光子学 光学元件和系统图纸的编制

2019-11-29

现行

BS 4301-1991

Recommendations for preparation of drawings for optical elements and systems
光学元件和系统图纸的编制建议

1991-08-30

现行

BS ISO 10110-13-1997

Optics and optical instruments. Preparation of drawings for optical elements and systems-Laser irradiation damage threshold
光学和光学仪器 准备光学元件和系统的图纸 激光辐照损伤阈值

1998-03-15

现行

BS ISO 10110-17-2004

Optics and optical instruments. Preparation of drawings for optical elements and systems-Laser irradiation damage threshold
光学和光学仪器 光学元件和系统图纸的编制

2004-06-01

现行

KS B ISO 10110-6

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제6부: 편심공차
光学和光学仪器光学元件和系统图纸的制备第6部分:定心公差

2017-11-27

现行

KS B ISO 10110-8

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제8부: 표면질감; 거칠기 및 파형
光学和光学仪器光学元件和系统图纸的制备第8部分:表面结构

2017-11-27

现行

KS B ISO 10110-6(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제6부: 편심공차
光学和光学仪器.光学元件和系统图纸的编制.第6部分:定心公差

2017-11-27

现行

KS B ISO 10110-8(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면작성 — 제8부: 표면질감; 거칠기 및 파형
光学和光学仪器.光学元件和系统图纸的制备.第8部分:表面结构

2017-11-27

现行

BS ISO 10110-5-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Surface form tolerances
光学和光子学 光学元件和系统图纸的编制

2015-08-31

现行

BS ISO 10110-9-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Surface treatment and coating
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

BS ISO 10110-11-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Non-toleranced data
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

KS B ISO 10110-1

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学 - 光学元件和系统图纸准备第1部分:总则

2017-09-28