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Noise and Vibration in Semiconductor Clean Rooms 半导体洁净室中的噪声和振动
由于新的高密度产品中使用了更小的线宽,对半导体微芯片制造洁净室中HVAC振动和噪声的担忧已成为一个额外的重要方面。被占用结构中设备振动的不利影响主要是烦扰和可能的损坏。然而,控制半导体洁净室的振动更为关键。10级洁净室的振动标准通常以微英寸表示。暖通空调设备的允许振动标准通常用密耳表示。机械设备的位置和类型以及地板的结构特征在振动控制中与用于控制机械设备振动的常见产品一样重要- -隔振器。高噪音水平对员工士气和生产力的影响也是众所周知的,并且有可接受的标准。即使地板不振动,高噪声水平也会直接通过空气过度振动敏感的工艺设备。单位:SICitation:研讨会,ASHRAE交易,1986年,第92卷,pt。1B,旧金山
Concern for HVAC vibration and noise in semiconductor microchip fabrication clean rooms has taken on an added and an important dimension as a result of the smaller line widths used in the new high density products.The adverse effects of equipment vibration in occupied structures are primarily annoyance and possible damages. However, control of vibration in a semiconductor clean room is even more critical. Vibration criterion for a Class 10 clean room is often expressed in microinches. The criterion for permissible vibration from HVAC equipment is usually expressed in mils. The location and type of the mechanical equipment and the structural characteristics of the floor are as important in vibration control as are the common products used in controlling vibration from mechanical equipment -- vibration isolators.The effect of high noise levels on employees' morale and productivity is likewise well known, and there are acceptable criteria. High noise levels can also excessively vibrate the sensitive process equipment directly through the air, even when the floor does not vibrate.Units: SI
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