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现行 MIL MIL-C-85455 Notice 1-Validation
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CHROMIUM-MOLYBDENUM PLATING (ELECTRODEPOSITED) (NO S/S DOCUMENT) 铬钼镀层(电沉积)(无S/S文件)
发布日期: 1991-10-29
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发布单位或类别: 美国-美国军事规范和标准
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现行
MIL MIL-C-85455
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1982-05-17
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MIL MIL-C-14538C Notice 1-Validation
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CHROMIUM PLATING, BLACK (ELECTRODEPOSITED) (SUPERSEDING MIL-C-14538B) (S/S BY MIL-DTL-14538D)
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1983-08-03
现行
MIL MIL-STD-1501C Notice 2-Inactivation
CHROMIUM PLATING, LOW EMBRITTLEMENT, ELECTRODEPOSITION (SUPERSEDING MIL-STD-1501B) (S/S BY MIL-STD-1501D)
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1991-10-04
现行
FED QQ-C-320B
CHROMIUM PLATING (ELECTRODEPOSITED) (SUPERSEDING QQ-C-320A AND AN-P-39A) (S/S BY SAE-AMS-QQ-C-320)
镀铬(电沉积)(取代QQ-C-320A和AN-P-39A)(由SAE-AMS-QQ-C-320提供)
1974-06-17
现行
FED QQ-C-320B
CHROMIUM PLATING (ELECTRODEPOSITED) (SUPERSEDING QQ-C-320A AND AN-P-39A) (S/S BY SAE-AMS-QQ-C-320)
镀铬(电沉积)(取代QQ-C-320A和AN-P-39A)(由SAE-AMS-QQ-C-320提供)
1974-06-17
现行
MIL MIL-C-7460A Notice 1-Cancellation
CHROMIUM PLATING, POROUS CHANNEL TYPE, SIRCRAFT ENGINE CYLINDERS (NO S/S DOCUMENT)
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1993-03-19
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MIL MIL-C-7460A
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1971-02-04
现行
MIL MIL-P-47184A Notice 1-Cancellation
PLATING, NICKEL-TUNGSTEN, ELECTRODEPOSIT ON ALUMINUM ALLOYS, BY SELECTIVE (BRUSH) METHOD (NO S/S DOCUMENT) (SUPERSEDING MIL-P-47184)
用选择性(刷)法在铝合金上电沉积镍钨镀层(无S/S文件)(代替MIL-P-47184)
1995-11-03
现行
MIL MIL-P-47184A
PLATING, NICKEL-TUNGSTEN, ELECTRODEPOSIT ON ALUMINUM ALLOYS, BY SELECTIVE (BRUSH) METHOD (NO S/S DOCUMENT) (SUPERSEDING MIL-P-47184)
用选择性(刷)法在铝合金上电沉积镍钨镀层(无S/S文件)(代替MIL-P-47184)
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