本文件规定了单板厚度、密度和界面宽度的评估方法 厚度在约1 nm和1µm之间的层状和多层薄膜 平面基板，通过X射线反射仪（XRR）测量。购买本文件时可获得的所有当前修订均包含在购买本文件中。

This document specifies a method for the evaluation of thickness, density and interface width of single layer and multi-layered thin films which have thicknesses between approximately 1 nm and 1 µm, on flat substrates, by means of X-Ray Reflectometry (XRR).All current amendments available at time of purchase are included with the purchase of this document.