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现行 MIL MIL-C-20218F Notice 2-Validation 2
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CHROMIUM PLATING, ELECTRODEPOSITED, POROUS 电镀多孔铬
发布日期: 2020-12-24
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发布单位或类别: 美国-美国军事规范和标准
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研制信息
相似标准/计划/法规
现行
MIL MIL-C-20218F Notice 1-Validation 1
CHROMIUM PLATING, ELECTRODEPOSITED, POROUS
电镀多孔铬
1991-02-05
现行
MIL MIL-C-20218F
CHROMIUM PLATING, ELECTRODEPOSITED, POROUS (SUPERSEDING MIL-C-20218E)
多孔电镀铬(取代MIL-C-20218E)
1984-11-13
现行
SAE AMSQQC320B
Chromium Plating (Electrodeposited)
镀铬(电沉积)
2008-01-23
现行
KS W 1123(2020 Confirm)
항공기용 전기 크롬 도금
镀铬(电沉积) - 飞机
1995-04-06
现行
MIL MIL-DTL-14538D Notice 1-Validation 1
CHROMIUM PLATING, BLACK (ELECTRODEPOSITED)
镀铬 黑色(电沉积)
2004-06-14
现行
MIL MIL-STD-1501E Change 1(change incorporated)
Chromium Plating, Low Embrittlement, Electrodeposition
镀铬、低脆化、电沉积
2009-04-28
现行
SAE AMS2407G
Plating, Chromium, Porous (Stabilized: Sep 2022)
多孔铬镀层(2022年9月稳定)
2022-09-14
现行
DOD DOD-STD-2182
ENGINEERING CHROMIUM PLATING (ELECTRODEPOSITED FOR REPAIR OF SHAFTING (METRIC)
工程镀铬(用于修复轴系的电沉积(公制)
1985-01-29
现行
MIL MIL-C-85455 Notice 1-Validation
CHROMIUM-MOLYBDENUM PLATING (ELECTRODEPOSITED) (NO S/S DOCUMENT)
铬钼镀层(电沉积)(无S/S文件)
1991-10-29
现行
MIL MIL-C-85455
CHROMIUM-MOLYBDENUM PLATING (ELECTRODEPOSITED) (NO S/S DOCUMENT)
铬钼电镀(电沉积)(无S/S文件)
1982-05-17
现行
MIL MIL-DTL-14538D
CHROMIUM PLATING, BLACK (ELECTRODEPOSITED) (SUPERSEDING MIL-C-14538C)
黑色镀铬(电沉积)(取代MIL-C-14538C)
1999-06-16
现行
MIL MIL-C-7460A Notice 1-Cancellation
CHROMIUM PLATING, POROUS CHANNEL TYPE, SIRCRAFT ENGINE CYLINDERS (NO S/S DOCUMENT)
镀铬 多孔通道型 SIRCRAFT发动机气缸(无S/S文件)
1993-03-19
现行
MIL MIL-C-7460A
CHROMIUM PLATING, POROUS CHANNEL TYPE, SIRCRAFT ENGINE CYLINDERS (NO S/S DOCUMENT)
镀铬 多孔通道型 SIRCRAFT发动机气缸(无S/S文件)
1971-02-04
现行
MIL MIL-C-14538C Notice 1-Validation
CHROMIUM PLATING, BLACK (ELECTRODEPOSITED) (SUPERSEDING MIL-C-14538B) (S/S BY MIL-DTL-14538D)
黑色(电沉积)(取代MIL-C-14538B)(S/S BY MIL-DTL-14538D)
1989-07-31
现行
MIL MIL-C-14538C
CHROMIUM PLATING, BLACK (ELECTRODEPOSITED) (SUPERSEDING MIL-C-14538B) (S/S BY MIL-DTL-14538D)
黑色镀铬(电沉积)(取代MIL-C-14538B)(由MIL-DTL-14538D替代)
1983-08-03
现行
MIL MIL-STD-1501C Notice 2-Inactivation
CHROMIUM PLATING, LOW EMBRITTLEMENT, ELECTRODEPOSITION (SUPERSEDING MIL-STD-1501B) (S/S BY MIL-STD-1501D)
镀铬 低脆化 电沉积(取代MIL-STD-1501B)
1996-12-09
现行
FED QQ-C-320B
CHROMIUM PLATING (ELECTRODEPOSITED) (SUPERSEDING QQ-C-320A AND AN-P-39A) (S/S BY SAE-AMS-QQ-C-320)
镀铬(电沉积)(取代QQ-C-320A和AN-P-39A)(由SAE-AMS-QQ-C-320提供)
1974-06-17
现行
FED QQ-C-320B
CHROMIUM PLATING (ELECTRODEPOSITED) (SUPERSEDING QQ-C-320A AND AN-P-39A) (S/S BY SAE-AMS-QQ-C-320)
镀铬(电沉积)(取代QQ-C-320A和AN-P-39A)(由SAE-AMS-QQ-C-320提供)
1974-06-17