现行

BS ISO 10110-1-2019

Optics and photonics. Preparation of drawings for optical elements and systems-General
光学和光子学 光学元件和系统图纸的编制

2019-10-11

现行

BS ISO 10110-6-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Centring tolerances
光学和光子学 光学元件和系统图纸的编制

2015-07-31

现行

BS ISO 10110-8-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Surface texture
光学和光子学 光学元件和系统图纸的编制

2019-11-22

现行

BS ISO 10110-12-2019

Optics and photonics. Preparation of drawings for optical elements and systems-Aspheric surfaces
光学和光子学 光学元件和系统图纸的编制

2019-11-29

现行

KS B ISO 10110-1(2022 Confirm)

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学.光学元件和系统图纸的制备.第1部分:总则

2017-09-28

现行

KS B ISO 10110-1

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学 - 光学元件和系统图纸准备第1部分:总则

2017-09-28

现行

ISO 10110-1-2019

Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
光学和光子学 - 光学元件和系统图纸准备第1部分:总则

2019-10-10

现行

BS ISO 10110-11-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Non-toleranced data
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

BS ISO 10110-9-2016

Optics and photonics. Preparation of drawings for optical elements and systems-Surface treatment and coating
光学和光子学 光学元件和系统图纸的编制

2016-07-31

现行

BS ISO 10110-5-2015

Optics and photonics. Preparation of drawings for optical elements and systems-Surface form tolerances
光学和光子学 光学元件和系统图纸的编制

2015-08-31

现行

KS B ISO 10110-12

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제12부: 비구면
光学和光子学.光学元件和系统绘图的制备.第12部分:非球面

2018-07-02

现行

KS B ISO 10110-12

광학과 포토닉스 — 광학 부품과 광학계의 도면 작성 — 제12부: 비구면
光学和光子学光学元件和系统制图第12部分:非球面

2023-11-01

现行

ISO 10110-7-2017

Optics and photonics — Preparation of drawings for optical elements and systems — Part 7: Surface imperfections
光学和光子学 - 准备光学元件和系统的图纸 - 第7部分:表面缺陷

2017-08-16

现行

ISO 10110-6-2015

Optics and photonics — Preparation of drawings for optical elements and systems — Part 6: Centring tolerances
光学和光子学 - 准备光学元件和系统的图纸 - 第6部分:定心公差

2015-07-23

现行

ISO 10110-16-2023

Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
光学和光子学.光学元件和系统图纸的制备.第16部分:衍射表面

2023-07-10

现行

ISO 10110-12-2019

Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
光学和光子学.光学元件和系统绘图的制备.第12部分:非球面

2019-11-26

现行

BS ISO 10110-19-2015

Optics and photonics. Preparation of drawings for optical elements and systems-General description of surfaces and components
光学和光子学 光学元件和系统图纸的编制

2015-07-31

现行

ISO 10110-8-2019

Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
光学和光子学.光学元件和系统绘图的制备.第8部分:表面结构

2019-11-15

现行

KS B ISO 10110-14(2020 Confirm)

광학 및 포토닉스－광학 부품 및 광학계의 도면 작성－제14부：파면 변형 공차
光学和光子学光学元件和系统图纸的制备第14部分:波前变形公差

2010-08-02

现行

KS B ISO 10110-11

광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제11부: 공차표시가 없는 제원
光学和光子学 - 准备光学元件0716和0716系统的图纸 -0716 第071611部分:非公0716差数据

2018-07-02