首页 馆藏资源 舆情信息 标准服务 科研活动 关于我们
现行 ISO/TR 21477:2017
到馆阅读
收藏跟踪
购买正版
Optics and photonics — Preparation of drawings for optical elements and systems — Surface imperfection specification and measurement systems 光学和光子学.光学元件和系统图纸的制备.表面缺陷规范和测量系统
发布日期: 2017-08-16
ISO/TR 21477:2017旨在指导用户理解ISO 10110-7和ISO 14997中规定和评估表面缺陷的两个系统之间的起源、含义和差异,特别是尺寸法和可见性法,并提供如何使用它们的信息。提供的表格显示了两个系统中缺陷的大致等效屈服损失规格。
ISO/TR 21477:2017 intends to guide the user to understand the origins, meanings and differences between the two systems of specifying and evaluating surface imperfections in ISO 10110-7 and ISO 14997, specifically the dimensional method and the visibility method, and to provide information on how to use them. Tables are provided to show specifications of roughly equivalent yield loss for imperfections in the two systems.
分类信息
关联关系
研制信息
归口单位: ISO/TC 172/SC 1
相似标准/计划/法规
现行
BS ISO 10110-1-2019
Optics and photonics. Preparation of drawings for optical elements and systems-General
光学和光子学 光学元件和系统图纸的编制
2019-10-11
现行
BS ISO 10110-6-2015
Optics and photonics. Preparation of drawings for optical elements and systems-Centring tolerances
光学和光子学 光学元件和系统图纸的编制
2015-07-31
现行
BS ISO 10110-8-2019
Optics and photonics. Preparation of drawings for optical elements and systems-Surface texture
光学和光子学 光学元件和系统图纸的编制
2019-11-22
现行
BS ISO 10110-12-2019
Optics and photonics. Preparation of drawings for optical elements and systems-Aspheric surfaces
光学和光子学 光学元件和系统图纸的编制
2019-11-29
现行
KS B ISO 10110-1
광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学 - 光学元件和系统图纸准备第1部分:总则
2017-09-28
现行
BS ISO 10110-11-2016
Optics and photonics. Preparation of drawings for optical elements and systems-Non-toleranced data
光学和光子学 光学元件和系统图纸的编制
2016-07-31
现行
BS ISO 10110-9-2016
Optics and photonics. Preparation of drawings for optical elements and systems-Surface treatment and coating
光学和光子学 光学元件和系统图纸的编制
2016-07-31
现行
BS ISO 10110-5-2015
Optics and photonics. Preparation of drawings for optical elements and systems-Surface form tolerances
光学和光子学 光学元件和系统图纸的编制
2015-08-31
现行
KS B ISO 10110-1(2022 Confirm)
광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제1부: 일반사항
光学和光子学.光学元件和系统图纸的制备.第1部分:总则
2017-09-28
现行
ISO 10110-1-2019
Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
光学和光子学 - 光学元件和系统图纸准备第1部分:总则
2019-10-10
现行
KS B ISO 10110-12
광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제12부: 비구면
光学和光子学.光学元件和系统绘图的制备.第12部分:非球面
2018-07-02
现行
BS ISO 10110-19-2015
Optics and photonics. Preparation of drawings for optical elements and systems-General description of surfaces and components
光学和光子学 光学元件和系统图纸的编制
2015-07-31
现行
KS B ISO 10110-12
광학과 포토닉스 — 광학 부품과 광학계의 도면 작성 — 제12부: 비구면
光学和光子学光学元件和系统制图第12部分:非球面
2023-11-01
现行
ISO 10110-12-2019
Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
光学和光子学.光学元件和系统绘图的制备.第12部分:非球面
2019-11-26
现行
ISO 10110-8-2019
Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture
光学和光子学.光学元件和系统绘图的制备.第8部分:表面结构
2019-11-15
现行
ISO 10110-6-2015
Optics and photonics — Preparation of drawings for optical elements and systems — Part 6: Centring tolerances
光学和光子学 - 准备光学元件和系统的图纸 - 第6部分:定心公差
2015-07-23
现行
ISO 10110-16-2023
Optics and photonics — Preparation of drawings for optical elements and systems — Part 16: Diffractive surfaces
光学和光子学.光学元件和系统图纸的制备.第16部分:衍射表面
2023-07-10
现行
ISO 10110-7-2017
Optics and photonics — Preparation of drawings for optical elements and systems — Part 7: Surface imperfections
光学和光子学 - 准备光学元件和系统的图纸 - 第7部分:表面缺陷
2017-08-16
现行
KS B ISO 10110-11
광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제11부: 공차표시가 없는 제원
光学和光子学 - 准备光学元件0716和0716系统的图纸 -0716 第071611部分:非公0716差数据
2018-07-02
现行
KS B ISO 10110-5
광학 및 포토닉스 — 광학 부품 및 광학계의 도면 작성 — 제5부: 표면형상공차
光学和光子学 - 光学元件和系统的图纸准备 - 第5部分:表面形状公差
2018-07-02