Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 62047-14:2012); German version EN 62047-14:2012
半导体器件.微机电器件.第14部分:金属薄膜材料的成形极限测量方法(IEC 62047-14-2012);德文版EN 62047-14:2012