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被代替 GB/T 24578-2009
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硅片表面金属沾污的全反射X光荧光光谱测试方法 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
发布日期: 2009-10-30
实施日期: 2010-06-01
废止日期: 2017-01-01
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相似标准/计划/法规
现行
GB/T 24578-2015
硅片表面金属沾污的全反射X光荧光光谱测试方法
Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
2015-12-10
现行
GB/T 34504-2017
蓝宝石抛光衬底片表面残留金属元素测量方法
Measurement method for surface metal contamination on sapphire polished substrate wafer
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GB/T 29505-2013
硅片平坦表面的表面粗糙度测量方法
Test method for measuring surface roughness on planar surfaces of silicon wafer
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现行
GB/T 24577-2009
热解吸气相色谱法测定硅片表面的有机污染物
Test methods for analyzing organic contaminants on silicon wafer surfaces by thermal desorption gas chromatography
2009-10-30
现行
SJ/T 11503-2015
碳化硅单晶抛光片表面粗糙度的测试方法
Test methods for measuring surface roughness of polished monocrystalline silicon carbide wafers
2015-04-30
现行
GB/T 24579-2009
酸浸取 原子吸收光谱法测定多晶硅表面金属污染物
Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-atomic absorption spectroscopy
2009-10-30
现行
GB/T 39145-2020
硅片表面金属元素含量的测定 电感耦合等离子体质谱法
Test method for the content of surface metal elements on silicon wafers—Inductively coupled plasma mass spectrometry
2020-10-11
现行
GB/T 29849-2013
光伏电池用硅材料表面金属杂质含量的电感耦合等离子体质谱测量方法
Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
2013-11-12
现行
GB/T 24582-2023
多晶硅表面金属杂质含量测定 酸浸取-电感耦合等离子体质谱法
Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method
2023-08-06