本文件描述了一种辉光放电光发射光谱法，用于测定金属氧化物薄膜的厚度、单位面积质量和化学成分。 该方法适用于厚度为1nm至10000nm的金属氧化膜。氧化物的金属元素可包括Fe、Cr、Ni、Cu、Ti、Si、Mo、Zn、Mg、Mn、Zr和Al中的一种或多种元素。可通过该方法测定的其他元素为O、C、N、H、P和S。

This document describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films. This method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn, Zr and Al. Other elements that can be determined by the method are O, C, N, H, P and S.