Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - determination of lateral resolution, analysis area, and sample area viewed by the analyser
Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Evaluation of thickness, density and interface width of thin films by X-ray reflectometry—Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry