Standard Test Method for Determining the Orientation of a Metal Crystal
测定金属晶体取向的标准试验方法

2019-11-01

半导体单晶晶向测定方法
Test methods for determining the orientation of a semiconductive single crystal

2023-08-06

蓝宝石单晶晶向测定方法
Test method for determining the orientation of sapphire single crystal

2017-09-07

Testing of materials for semiconductor technology; determination of the orientation of single crystals by means of Laue back scattering
半导体技术材料测试；用劳厄背散射法测定单晶的取向

1982-04-01

晶体材料X射线衍射仪旋转定向测试方法
Testing methods of X-ray diffraction for determining the orientation of crystal materials by rotation

2019-08-30

Studies and comparisons of magnetic measurements on grain-oriented electrical steelsheet determined by the single sheet test method and Epstein test method
单板法和爱泼斯坦法测定取向电工钢片磁性测量的研究与比较

2017-08-18

Studies and comparisons of magnetic measurements on grain-oriented electrical steelsheet determined by the single sheet test method and Epstein test method
单板法和爱泼斯坦法测定取向电工钢片磁性测量的研究与比较

2017-05-22

단일강판 시험방법과 엡스타인 시험방법에 의한 방향성 전기강판의 자기 측정의 연구 및 비교
单板法和爱泼斯坦法测定取向电工钢片磁性测量的研究与比较

2021-08-03

Standard Test Method for X-Ray Determination of Retained Austenite in Steel with Near Random Crystallographic Orientation
近随机结晶取向钢中残余奥氏体的X射线测定的标准试验方法

2022-11-01

Testing of materials for semiconductor technology; determination of the dopant concentration profile of single crystalline semiconductor material by means of the capacitancevoltage method and mercury contact
半导体技术材料测试；用电容电压法和汞接触法测定单晶半导体材料的掺杂浓度分布

1982-10-01

Semiconductor devices. Micro-electromechanical devices-Test methods for determining residual stresses of MEMS films. Wafer curvature and cantilever beam deflection methods
半导体器件 微机电设备

2015-07-31

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods
半导体器件 - 微机电器件 - 第16部分:确定MEMS膜残余应力的测试方法 - 晶片曲率和悬臂梁偏转方法

2015-03-05

Semiconductor devices - Micro-electromechanical devices - Part 48: Test method for determining solution concentration by optical absorption using MEMS fluidic device
半导体器件.微机电器件.第48部分:使用MEMS流体器件通过光吸收测定溶液浓度的试验方法

2024-06-07

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods (IEC 62047-16:2015); German version EN 62047-16:2015
半导体器件.微机电器件.第16部分:测定MEMS薄膜残余应力的试验方法.圆片弯曲和悬臂梁偏转法（IEC 62047-16-2015）；德文版EN 62047-16:2015

2015-12-01