现行

BS ISO 14706-2014

Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 全反射X射线荧光光谱法测定硅片表面元素污染

2014-07-31

现行

JIS K 0148-2005

Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析用全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染

2005-01-01

现行

GB/T 40110-2021

表面化学分析 全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

2021-05-21

现行

ISO 14706-2014

Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 - 通过全反射X射线荧光（TXRF）光谱测定硅晶片上的表面元素污染

2014-07-25

现行

ISO 24465-2023

Surface chemical analysis — Determination of the minimum detectability of surface plasmon resonance device
表面化学分析.表面等离子体共振装置最小可检测性的测定

2023-01-10

现行

AS ISO 17974-2006

Surface chemical analysis - High-resolution Auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis
表面化学分析.高分辨率俄歇电子光谱仪.元素和化学状态分析用能标的校准

2006-10-20

现行

BS ISO 17974-2002

Surface chemical analysis. High-resolution Auger electron spectrometers. Calibration of energy scales for elemental and chemical-state analysis
表面化学分析 高分辨率俄歇电子光谱仪 元素和化学状态分析用能量标度的校准

2002-11-29

现行

KS D ISO 17974(2021 Confirm)

표면 화학 분석－고분해능 오제 전자 분광기－원소 및 화학 상태 분석을 위한 에너지 눈금 교정
表面化学分析——高分辨率俄歇电子光谱仪——元素和化学状态分析用能标的校准

2011-12-30

现行

ISO 17974-2002

Surface chemical analysis — High-resolution Auger electron spectrometers — Calibration of energy scales for elemental and chemical-state analysis
表面化学分析——高分辨率俄歇电子能谱仪——元素和化学状态分析用能量标度的校准

2002-10-17

现行

KS D ISO 17974(2016 Confirm)

표면 화학 분석－고분해능 오제 전자 분광기－원소 및 화학 상태 분석을 위한 에너지 눈금 교정
表面化学分析高分辨率俄歇电子能谱仪元素和化学状态分析用能标的校准

2011-12-30

现行

GB/T 29731-2013

表面化学分析 高分辨俄歇电子能谱仪 元素和化学态分析用能量标校准
Surface chemical analysis - High resolution auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis

2013-09-18

现行

BS ISO 17331-2004+A1-2010

Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 硅片工作标准物质表面元素收集的化学方法及其全反射X射线荧光光谱测定

2010-09-30

现行

GB/T 30701-2014

表面化学分析 硅片工作标准样品表面元素的化学收集方法和全反射X射线荧光光谱法（TXRF）测定
Surface chemical analysis―Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

2014-03-27

现行

ISO 17331-2004

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析——硅片工作标准物质表面元素收集的化学方法及其全反射X射线荧光光谱测定

2004-05-18

现行

BS ISO 17973-2016

Surface chemical analysis. Medium-resolution Auger electron spectrometers. Calibration of energy scales for elemental analysis
表面化学分析 中分辨率俄歇电子光谱仪 元素分析用能量标度的校准

2016-09-30

现行

KS D ISO 17973(2021 Confirm)

표면 화학 분석－중분해능 오제 전자 분광기－원소 분석을 위한 에너지 눈금 교정
表面化学分析——中分辨率俄歇电子光谱仪——元素分析用能标的校准

2011-12-30

现行

ISO 17973-2024

Surface chemical analysis — Medium-resolution Auger electron spectrometers — Calibration of energy scales for elemental analysis
表面化学分析中分辨俄歇电子能谱仪元素分析能标的校准

2024-07-03

现行

KS D ISO 17973(2016 Confirm)

표면 화학 분석－중분해능 오제 전자 분광기－원소 분석을 위한 에너지 눈금 교정
表面化学分析中分辨率俄歇电子能谱仪元素分析用能标的校准

2011-12-30

现行

GB/T 29732-2021

表面化学分析 中等分辨俄歇电子能谱仪 元素分析用能量标校准
Surface chemical analysis—Medium resolution auger electron spectrometers—Calibration of energy scales for elemental analysis

2021-12-31

现行

ISO 17331-2004/Amd 1-2010

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
表面化学分析.硅片工作标准物质表面元素收集及其全反射X射线荧光光谱测定的化学方法.修改件1

2010-07-05